Advanced Mask Technology Center GmbH & Co. KG

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 995
 
  
 
B08B CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL 157
 
  
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS198
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 1361

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9405185 Shape metrology for photomasksApr 07, 14Aug 02, 16[G01B, G03F, G01F]
8932785 EUV mask set and methods of manufacturing EUV masks and integrated circuitsOct 16, 12Jan 13, 15[G03F]
8293431 Lithographic mask and method of forming a lithographic maskApr 16, 10Oct 23, 12[G03F]
8257888 Particle beam writing method, particle beam writing apparatus and maintenance method for sameOct 26, 09Sep 04, 12[G03F]
8142958 EUV mask and method for repairing an EUV maskJun 20, 08Mar 27, 12[G03F]
7820343 Method for producing a photomask, method for patterning a layer or layer stack and resist stack on a mask substrateOct 25, 07Oct 26, 10[H01L, G03C, G03F]
7811727 Method for determining an exposure dose and exposure apparatusNov 17, 06Oct 12, 10[G03F]
7789964 Method for cleaning a surface of a photomaskOct 20, 06Sep 07, 10[B08B]
7354684 Test pattern and method of evaluating the transfer properties of a test patternMar 05, 07Apr 08, 08[G03F]

Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2011/0027,699 REDUCING ION MIGRATION OF ABSORBER MATERIALS OF LITHOGRAPHY MASKS BY CHROMIUM PASSIVATIONAbandonedJul 13, 10Feb 03, 11[G03F]
2008/0318,139 Mask Blank, Photomask and Method of Manufacturing a PhotomaskAbandonedJun 23, 08Dec 25, 08[G03F]
2007/0263,192 Illumination system and a photolithography apparatus employing the systemAbandonedMay 14, 07Nov 15, 07[G03B]
2006/0236,921 Method of cleaning a substrate surface from a crystal nucleusAbandonedApr 10, 06Oct 26, 06[C30B]

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